The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2018

Filed:

Jul. 01, 2016
Applicant:

Rigaku Corporation, Tokyo, JP;

Inventors:

Yasujiro Yamada, Takatsuki, JP;

Shinya Hara, Takatsuki, JP;

Makoto Doi, Austin, TX (US);

Assignee:

Rigaku Corporation, Akishima-shi, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01); G01N 23/207 (2018.01);
U.S. Cl.
CPC ...
G01N 23/223 (2013.01); G01N 23/207 (2013.01); G01N 2223/076 (2013.01); G01N 2223/0766 (2013.01);
Abstract

A measurement line evaluation unit (): calculates, for all of specified measurement lines, estimated measured intensities by theoretical calculation on the basis of a composition and/or a thickness specified for a thin film; changes, by a predetermined amount, only an estimated measured intensity of one measurement line, and obtains quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity, for each changed measurement line, by a fundamental parameter method; and estimates a quantitative error and/or determines possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.


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