The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Nov. 13, 2015
Asml Netherlands B.v., Veldhoven, NL;
Guangqing Chen, Fremont, CA (US);
Shufeng Bai, San Carlos, CA (US);
Eric Richard Kent, San Jose, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
Paul Anthony Tuffy, Los Gatos, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
Youping Zhang, Fremont, CA (US);
Gertjan Zwartjes, 's-Hertogenbosch, NL;
Jan Wouter Bijlsma, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than 'building' the device geometry element-by-element.