The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2018

Filed:

Jun. 27, 2014
Applicant:

Sunedison Semiconductor Limited (Uen201334164h), Singapore, SG;

Inventors:

Benno Orschel, St. Louis, MO (US);

Arash Abedijaberi, St. Peters, MO (US);

Gang Wang, St. Peters, MO (US);

Ellen Torack, St. Louis, MO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05D 23/19 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/418 (2013.01); G05D 23/1917 (2013.01); G05B 2219/45032 (2013.01);
Abstract

A method for controlling temperatures in an epitaxial reactor for use in a wafer-production process is provided. The method is implemented by a computing device coupled to a memory. The method includes transmitting, to a heating device in a first zone of the epitaxial reactor, an output power instruction representing a base output power. The method additionally includes determining an actual time period for a temperature in the first zone of the epitaxial reactor to reach a target temperature, determining a difference between the actual time period and a reference time period, determining an output power offset based on the difference, and storing the output power offset in the memory in association with the heating device.


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