The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2018

Filed:

Oct. 28, 2015
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Pavel Potocek, Eindhoven, NL;

Cornelis Sander Kooijman, Veldhoven, NL;

Hendrik Jan de Vos, Eindhoven, NL;

Hendrik Nicolaas Slingerland, Venlo, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/265 (2013.01); H01J 2237/15 (2013.01); H01J 2237/24495 (2013.01);
Abstract

The invention relates to a scanning-type charged particle microscope and a method for operation of such a microscope. Disclosed is a novel scanning strategy to the raster scan or serpentine scan. In some embodiment, the beam scanning motion is separated into short-stroke and long-stroke movements, to be assigned to associate short-stroke and long-stroke scanning devices, which may be beam deflectors or stage actuators. The scan strategy which is less susceptible to effects such as overshoot, settling/resynchronization, and 'backlash' effects.


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