Company Filing History:
Years Active: 2002
Title: The Innovative Contributions of Zoe Osborne
Introduction
Zoe Osborne is a prominent inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of critical dimension measurement. His innovative approach has led to advancements that enhance the accuracy and efficiency of semiconductor inspections.
Latest Patents
Zoe Osborne holds a patent for an invention titled "Automatic field sampling for CD measurement." This method and apparatus are designed to inspect semiconductor wafers for field-to-field critical dimension (CD) variations using statistical techniques. The invention allows for the optimal selection of fields on the wafer to be measured, thereby increasing the accuracy of inspection results while avoiding unnecessary sampling. The process involves randomly selecting a predetermined number of fields for inspection and measuring the CD of comparable features using a critical dimension scanning electron microscope (CD-SEM). A statistical function, such as an average or standard deviation, is calculated from the measured CDs. The inspection procedure continues until the last acquired CD does not significantly change the average or standard deviation, ensuring statistically accurate results and increased production throughput.
Career Highlights
Zoe Osborne is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on improving inspection techniques that are crucial for the manufacturing of semiconductor devices. With his expertise, he has contributed to enhancing the quality and reliability of semiconductor products.
Collaborations
Zoe collaborates with his coworker, Bo Su, to further develop innovative solutions in semiconductor technology. Their combined efforts aim to push the boundaries of what is possible in the field.
Conclusion
Zoe Osborne's contributions to semiconductor technology through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods for critical dimension measurement are paving the way for more accurate and efficient semiconductor inspections.