Hefei, China

Ziwen Shen


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Ziwen Shen in Ultrasonic Gas Flow Measurement

Introduction

Ziwen Shen is an accomplished inventor based in Hefei, China. He has made significant contributions to the field of ultrasonic gas flow measurement. His innovative approach combines advanced technologies to enhance the accuracy and efficiency of gas flow measurement systems.

Latest Patents

Ziwen Shen holds a patent for an "Ultrasonic gas flow meter based on FPGA and DSP." This invention consists of ultrasonic gas transducers and sensor components, transmitting/receiving signal channel switch circuits, a driving signal generation and amplification circuit, an echo signal conditioning and collection circuit, a time sequential controlling and signal processing circuit, a man-machine interface, a serial communication module, and a power management module. The propagation time of ultrasonic echo waves is calculated by adopting a variable ratio threshold and zero-crossing detection method of tracking the maximum peak of the echo signal to obtain gas flow rates. This innovative design significantly improves the precision of gas flow measurements.

Career Highlights

Ziwen Shen is affiliated with Hefei University of Technology, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications in various industries, particularly in energy and environmental monitoring.

Collaborations

Ziwen Shen collaborates with notable colleagues, including Kejun Xu and Min Fang, who contribute to his research endeavors. Their combined expertise fosters a dynamic environment for innovation and development.

Conclusion

Ziwen Shen's contributions to ultrasonic gas flow measurement exemplify the impact of innovative thinking in engineering and technology. His patent reflects a commitment to enhancing measurement accuracy, which is crucial for various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…