Zhuxu Wang

Title: Innovations of Zhuxu Wang in Dielectric Etching Technology

Introduction

Zhuxu Wang is a notable inventor based in Cupertino, California. He has made significant contributions to the field of semiconductor manufacturing, particularly in dielectric etching technology. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of etching processes.

Latest Patents

Zhuxu Wang holds a patent for a method titled "Flash step preparatory to dielectric etch." This patent describes a dielectric plasma etch method that is particularly useful for preventing residue formation in large open pad areas. These areas are critical for monitoring the etching of narrow via and contact holes. The method employs a highly polymerizing chemistry, preferably a low-F/C fluorocarbon, in conjunction with oxygen and argon. A short flash step precedes the main plasma etch, utilizing a gas that is less polymerizing than that of the main etch. This innovative approach ensures that the plasma remains active between the flash and main steps, which can also be used to remove an anti-reflection coating covering the dielectric layer.

Career Highlights

Throughout his career, Zhuxu Wang has demonstrated a commitment to advancing semiconductor technologies. His work has been instrumental in developing methods that improve the reliability and precision of etching processes. His patent reflects his expertise and innovative thinking in the field.

Collaborations

Zhuxu Wang has collaborated with notable professionals in the industry, including Jingbao Liu and Claes H Bjorkman. These collaborations have contributed to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Zhuxu Wang's contributions to dielectric etching technology exemplify his innovative spirit and dedication to advancing the semiconductor industry. His patent showcases a significant advancement that addresses critical challenges in the etching process.