Zhongliang Chang

Title: Innovations of Zhongliang Chang in Metal Sputtering Technology

Introduction

Zhongliang Chang is a notable inventor based in Lanzhou, China. He has made significant contributions to the field of material science, particularly in the area of metal sputtering technology. His innovative approach has led to the development of a unique device and method for depositing metal on magnetic powder materials.

Latest Patents

Zhongliang Chang holds a patent for a "Device and method for sputtering and depositing metal on surface of magnetic powder materials." This invention utilizes a vacuum chamber, a vacuum pump set, a magnetron sputtering target, a cathode ion source, a water-cooled anode, and a sample holding component arranged within the vacuum chamber. The sample holding component is designed as a sample roller that can rotate around its horizontal axis. The innovative design allows for efficient metal deposition, enhancing the properties of magnetic powder materials.

Career Highlights

Zhongliang Chang is affiliated with the Lanzhou Institute of Chemical Physics, where he continues to advance research in his field. His work has garnered attention for its practical applications in various industries, including electronics and materials engineering. With 1 patent to his name, he exemplifies the spirit of innovation that drives technological progress.

Collaborations

Zhongliang has collaborated with esteemed colleagues such as Bin Zhang and Ning Xia. Their combined expertise has contributed to the advancement of research and development in the field of chemical physics.

Conclusion

Zhongliang Chang's contributions to metal sputtering technology highlight the importance of innovation in material science. His work not only enhances the understanding of metal deposition processes but also paves the way for future advancements in the industry.