Zhiyuan Shi

Title: Zhiyuan Shi: Innovator in Hexagonal Boron Nitride Film Technology

Introduction

Zhiyuan Shi is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the development of advanced methods for preparing hexagonal boron nitride films. His innovative approach has the potential to impact various applications in two-dimensional material devices.

Latest Patents

Zhiyuan Shi holds a patent for a "Method for preparing multi-layer hexagonal boron nitride film." This patent outlines a process that includes preparing a substrate, a boron-containing solid catalyst, and annealing the catalyst to create a multi-layer hexagonal boron nitride film. The method allows for the production of films with lateral sizes in the order of inches and thicknesses ranging from several nanometers to several hundred nanometers. This advancement provides a favorable basis for the application of hexagonal boron nitride in various technological fields.

Career Highlights

Zhiyuan Shi is affiliated with the Chinese Academy of Sciences, where he conducts his research and development activities. His work has garnered attention for its innovative approach and practical applications in the field of materials science. With a focus on hexagonal boron nitride, he continues to push the boundaries of what is possible in two-dimensional materials.

Collaborations

Zhiyuan Shi has collaborated with notable colleagues, including Tianru Wu and Guangyuan Lu. These partnerships have contributed to the advancement of research in the field and have fostered a collaborative environment for innovation.

Conclusion

Zhiyuan Shi's contributions to the field of hexagonal boron nitride film technology exemplify the spirit of innovation. His patented methods and collaborative efforts position him as a key figure in advancing materials science.