Zhiming M Wang

Title: The Innovative Contributions of Zhiming M Wang

Introduction

Zhiming M Wang is a prominent inventor based in Evanston, IL, known for his significant contributions to the field of materials science and electronic devices. With a total of 3 patents, his work focuses on developing advanced dielectric materials and semiconductor technologies.

Latest Patents

Wang's latest patents include "Crosslinked polymeric dielectric materials and electronic devices incorporating same," which provides solution-processable dielectric materials along with precursor compositions and processes for their preparation. This innovation also encompasses composites and electronic devices that utilize these dielectric materials. Another notable patent is "Acene-based organic semiconductor materials and methods of preparing and using the same," which introduces acene-based compounds that can be used to create n-type semiconductor materials, along with the processes for their preparation. This patent also covers composites and electronic devices that incorporate these n-type semiconductor materials.

Career Highlights

Throughout his career, Zhiming M Wang has worked with esteemed institutions such as Northwestern University and Polyera Corporation. His research and development efforts have significantly advanced the understanding and application of polymeric and semiconductor materials in electronic devices.

Collaborations

Wang has collaborated with notable colleagues, including Antonio Facchetti and Tobin Jay Marks, contributing to a rich exchange of ideas and innovations in the field.

Conclusion

Zhiming M Wang's innovative work in dielectric materials and semiconductor technologies has made a lasting impact on the field of materials science. His patents reflect a commitment to advancing electronic device capabilities through novel materials and processes.