Zhihao Chu

Title: Zhihao Chu: Innovator in Optical Proximity Correction

Introduction

Zhihao Chu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optical proximity correction (OPC). His innovative methods have the potential to enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

Zhihao Chu holds a patent for an "Optical proximity correction method based on hybrid simulation model." This method involves grouping original design patterns into two categories based on size. A simple OPC model and a complex OPC model are established for these groups using different numbers of convolution kernels. The combination of these models results in a hybrid OPC model that effectively shortens processing time and increases flexibility in utilizing OPC resources.

Career Highlights

Zhihao Chu is associated with Shanghai Huali Microelectronics Corporation, where he applies his expertise in optical proximity correction. His work has been instrumental in advancing the capabilities of OPC technology in the semiconductor industry.

Collaborations

Zhihao has collaborated with notable colleagues, including Han Chen and Fang Wei. Their combined efforts contribute to the innovative projects at Shanghai Huali Microelectronics Corporation.

Conclusion

Zhihao Chu's contributions to optical proximity correction demonstrate his commitment to innovation in the semiconductor field. His patent reflects a significant advancement that can lead to more efficient manufacturing processes.