Company Filing History:
Years Active: 2022-2025
Title: Innovations of Zheng Chai in Adhesive Compositions and Asphalt Additives
Introduction
Zheng Chai is an accomplished inventor based in Houston, TX, known for his contributions to adhesive compositions and asphalt additives. With a total of 4 patents to his name, he has made significant strides in enhancing material performance in various applications.
Latest Patents
One of Zheng Chai's latest patents focuses on BHM in adhesive compositions. This innovative adhesive composition consists of a first part comprising an epoxy resin and a second part that includes a multifunctional amine package. The multifunctional amine package features bis(hexamethylene)triamine and a synergist, with the amine concentration being at least 10% less than that of the epoxy resin. This unique formulation demonstrates a sag resistance of greater than 40 mm, making it highly effective for various applications.
Another notable patent involves asphalt additives. This invention provides antistripping compositions that can be utilized as additives to bitumen compositions, such as asphalt concrete, to mitigate water damage susceptibility. The antistripping compositions include a triamine component and a nitrile component, enhancing the durability of asphalt mixtures.
Career Highlights
Zheng Chai is currently employed at Ascend Performance Materials Operations LLC, where he continues to innovate and develop new materials. His work has significantly impacted the field of adhesive and asphalt technology, showcasing his expertise and commitment to advancing material science.
Collaborations
Zheng has collaborated with notable colleagues, including Jefferson Thomas Ebert and Benjamin Haseltine, contributing to a dynamic and innovative work environment.
Conclusion
Zheng Chai's contributions to adhesive compositions and asphalt additives highlight his role as a leading inventor in material science. His innovative patents reflect a commitment to enhancing product performance and durability in various applications.