Company Filing History:
Years Active: 2010-2023
Title: Zenichi Hamaya: Innovator in Imprint Technology
Introduction
Zenichi Hamaya is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of imprint technology, holding a total of eight patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of imprinting processes.
Latest Patents
Hamaya's latest patents include an innovative imprint method and an imprint apparatus designed for manufacturing articles. The imprint method involves forming a pattern of an imprint material on a substrate using a mold. This process includes dispensing the imprint material onto the substrate, moving the substrate below the mold, and supplying a gas that promotes the filling of the imprint material into the mold's pattern. Additionally, if a target shot region meets specific conditions, a second gas with a lower oxygen concentration than air is supplied to enhance the process. His imprint apparatus is designed to reduce the consumption of replacement gas, featuring a gas supply unit, a positioning unit, and a controller that manages the interactions between the mold and the substrate.
Career Highlights
Zenichi Hamaya has dedicated his career to advancing imprint technology, particularly in the context of manufacturing processes. His innovative approaches have led to significant improvements in the efficiency of imprinting techniques, making him a valuable asset in his field.
Collaborations
Throughout his career, Hamaya has collaborated with notable colleagues, including Noriyasu Hasegawa and Setsuo Yoshida. These collaborations have further enriched his work and contributed to the development of advanced imprint technologies.
Conclusion
Zenichi Hamaya's contributions to imprint technology exemplify his innovative spirit and dedication to improving manufacturing processes. His patents and collaborative efforts continue to influence the field, showcasing the importance of innovation in technology.