AUGUSTA, GA, United States of America

Zachary Duca


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Zachary Duca in Sputtering Technology

Introduction

Zachary Duca is an accomplished inventor based in Augusta, GA (US). He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of sputtering apparatuses.

Latest Patents

Zachary Duca holds a patent for a "Sputtering apparatus and related systems and methods for sputtering substrates." This invention includes a substrate holder assembly designed to support multiple elongated substrates in relation to a sputtering source. Each substrate extends along its respective axis, and the apparatus features a holder drive assembly that rotates the substrate holder assembly about a holder axis. Notably, each substrate axis is oriented non-parallel to the holder axis. Additionally, the substrate drive assembly allows for the individual rotation of each elongated substrate about its respective axis. This innovative design enables the deposition of sputtered material onto the substrates while maintaining simultaneous rotations.

Career Highlights

Zachary Duca is currently employed at Battelle Savannah River Alliance, LLC, where he continues to develop and refine his inventions. His work at this organization has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to technology.

Collaborations

One of his notable coworkers is John T. Bobbitt, III. Their collaboration has likely fostered an environment of innovation and creativity, leading to advancements in their respective projects.

Conclusion

Zachary Duca's contributions to sputtering technology through his patent demonstrate his commitment to innovation and excellence in his field. His work not only advances technology but also sets a foundation for future developments in sputtering apparatuses.

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