Company Filing History:
Years Active: 2001
Title: Yuzo Irie: Pioneer in Semiconductor Technology
Introduction
Yuzo Irie, an innovative inventor based in Hyogo, Japan, has made significant contributions to the field of semiconductor technology. With a focus on developing advanced manufacturing methods, he holds a notable patent that stands out in the semiconductor industry.
Latest Patents
Irie's most recent patent is titled "Semiconductor device and manufacturing method thereof." This invention involves a sophisticated gate electrode design, which consists of a polycrystalline silicon layer, a barrier layer, and a metal layer. Notably, the metal layer incorporates tungsten (W), while the barrier layer features ruthenium oxide (RuO). A unique aspect of the invention involves the etching process, wherein the metal and barrier layers are etched using either the barrier layer or the polycrystalline silicon layer as an etching stopper. This innovative approach enhances the efficiency and performance of semiconductor devices.
Career Highlights
Yuzo Irie is currently associated with Mitsubishi Electric Corporation, a leader in the electronics industry. His tenure at Mitsubishi has enabled him to work at the forefront of technological advancements in semiconductor applications. His expertise and dedication to research have been pivotal in driving innovations within the company.
Collaborations
Throughout his career, Yuzo Irie has collaborated with renowned colleagues, including Nobuo Fujiwara and Takahiro Maruyama. These collaborations have fostered a dynamic exchange of ideas and have led to the development of groundbreaking technologies in the field of semiconductors.
Conclusion
Yuzo Irie's contributions to semiconductor technology reflect his innovative spirit and commitment to excellence. His patent highlights not only his technical expertise but also the potential for further advancements in semiconductor manufacturing methods. With a strong foundation in collaboration and a career dedicated to innovation, Irie continues to pave the way for future developments in this crucial industry.