Company Filing History:
Years Active: 2025
Title: Innovations by Yupeng Liu in RF Front End Technology
Introduction
Yupeng Liu is an accomplished inventor based in Summitt, NJ (US). He has made significant contributions to the field of radio frequency (RF) technology, particularly in the area of transmitter RF front ends. His innovative work has led to the development of a patented method that enhances the performance of RF systems.
Latest Patents
Yupeng Liu holds a patent titled "Determining LO leakage and quadrature error parameters of an RF front end." This patent presents a method and system for estimating local oscillator (LO) leakage and quadrature error parameters in a direct up-conversion transmitter RF front end. The proposed method utilizes a pseudo-random noise (PN) sequence inserted at the transmitter baseband. At the observation receiver side, an RX accumulator is implemented to sum receiver signals, taking advantage of a despreading gain using the same PN sequence from the transmitter side. Through this despreading process, the receiver-transmitter channel can be estimated, allowing for the extraction of quadrature error parameters. Additionally, the estimated channel can be used to eliminate user data interference within the RX accumulator output, further aiding in the computation of LO leakage.
Career Highlights
Yupeng Liu is currently employed at Analog Devices, Inc., where he continues to innovate and contribute to advancements in RF technology. His work has been instrumental in improving the efficiency and accuracy of RF systems, making a lasting impact in the industry.
Collaborations
Yupeng Liu has collaborated with notable colleagues, including Reza Alavi and Adam Ruan. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Yupeng Liu's contributions to RF front end technology through his patented methods demonstrate his expertise and commitment to innovation. His work not only enhances the performance of RF systems but also sets a foundation for future advancements in the field.