Company Filing History:
Years Active: 2011
Title: Innovations of Yun Rak Kim in Capacitor Technology
Introduction
Yun Rak Kim is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of capacitor technology, particularly through his innovative methods that enhance the performance and reliability of capacitors.
Latest Patents
Yun Rak Kim holds a patent for a "Method of connecting a bus bar to a capacitor." This invention discloses a method for connecting a bus bar of a capacitor, which improves temperature characteristics and reliability by reducing inductance and impedance. This reduction helps to restrain heat generation during the capacitor's use. The method involves insulatingly connecting a pair of bus bars to the sprayed surfaces on both sides of multiple capacitor devices. Lead frames arranged alternately on the first bus bar connect in contact with the sprayed surfaces facing diagonally of neighboring capacitor devices. Similarly, other lead frames on the second bus bar connect to the sprayed surfaces facing in another diagonal direction, forming an X-shape. The pair of bus bars are then assembled to be insulated from each other and overlapped at one side of the capacitor device. This innovative approach has the potential to significantly enhance the efficiency and safety of capacitors.
Career Highlights
Yun Rak Kim is currently associated with Nuintek Co., Ltd., where he continues to develop and refine his inventions. His work has been instrumental in advancing capacitor technology, making it more efficient and reliable for various applications.
Collaborations
Yun Rak Kim has collaborated with notable colleagues, including Chang Hoon Yang and Dae Jin Park. Their combined expertise has contributed to the successful development of innovative technologies in the field.
Conclusion
Yun Rak Kim's contributions to capacitor technology through his innovative patent demonstrate his commitment to enhancing electronic components. His work not only improves the performance of capacitors but also sets a foundation for future advancements in the field.