Odawara, Japan

Yukihiro Kobayashi


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yukihiro Kobayashi

Introduction

Yukihiro Kobayashi is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent. His work is recognized for its potential applications in various industries, including electronics and materials science.

Latest Patents

Kobayashi holds a patent for a sputtering apparatus. This apparatus includes a target holder placed in a vacuum vessel, designed to hold a target that deposits a film on a substrate. The device features a substrate holder for mounting the substrate, along with a first shield member that can transition between a closed state, shielding the substrate holder and target holder from each other, and an open state, allowing interaction. The apparatus also includes a first opening/closing driving unit, a second shield member, and a driving unit that moves the substrate holder to facilitate the sputtering process. The design incorporates first and second protruding portions that fit together in a non-contact state, enhancing the efficiency of the sputtering process.

Career Highlights

Kobayashi is currently employed at Canon Anelva Corporation, where he continues to develop innovative technologies. His work has contributed to advancements in sputtering techniques, which are essential for the production of thin films used in various applications.

Collaborations

Kobayashi has collaborated with notable colleagues, including Nobuo Yamaguchi and Kazuaki Matsuo. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yukihiro Kobayashi's contributions to sputtering technology exemplify the impact of innovative thinking in the field of materials science. His patent for a sputtering apparatus showcases his commitment to advancing technology and improving manufacturing processes.

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