Location History:
- Tokyo, JP (2015 - 2019)
- Chiyoda-ku, JP (2019)
Company Filing History:
Years Active: 2015-2019
Title: Yuki Hatanaka: Innovator in Antireflection Technologies
Introduction
Yuki Hatanaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of substrates with advanced properties. With a total of 3 patents to his name, Hatanaka's work is recognized for its innovative approach to enhancing the functionality of various devices.
Latest Patents
Hatanaka's latest patents include a substrate with an antireflection layer. This invention provides a substrate that not only exhibits excellent antireflection properties but also possesses high water and oil repellency, along with favorable stain removability. Another notable patent is an ultraviolet-light-emitting device that utilizes an adhesive with a low glass transition temperature. This adhesive is designed to bond polymer adherends made from a fluorine-containing alicyclic structure, ensuring strong adhesion even when exposed to ultraviolet light or heat.
Career Highlights
Throughout his career, Hatanaka has worked with notable companies such as AGC Inc. and Dena Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field.
Collaborations
Hatanaka has collaborated with esteemed colleagues, including Kenji Ishizeki and Akira Isobe. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.
Conclusion
Yuki Hatanaka's contributions to the field of materials science and his innovative patents highlight his role as a leading inventor. His work continues to influence advancements in technology and materials.