Company Filing History:
2 out of 58,132 
1 out of 4 
1 out of 3 Years Active: 1994
Title: Yuichiro Shimose: Innovator in Sputtering Technology
Introduction
Yuichiro Shimose is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of sputtering technology, holding 2 patents that enhance the efficiency and effectiveness of thin film deposition processes.
Latest Patents
One of his latest patents is for a sputtering apparatus that improves the ability to judge whether a normal thin film has been satisfactorily deposited on a substrate. This apparatus utilizes detection results from the pressure in a vacuum chamber and the waveform of discharge output power to make immediate judgments after the sputtering process. The invention includes necessary condition-determining means, executed result-detecting means, comparing means, and judging means to ensure optimal thin film deposition. This advancement allows for the early detection of abnormalities in the film deposition process, significantly enhancing manufacturing efficiency.
Another patent by Shimose is a sucked substrate detecting apparatus. This device features sucking pads for disk substrates, a main pipe, and a vacuum pump, along with pressure sensors and controllers. It can determine the presence and quality of the disk substrate being sucked by the pads based on output levels from the pressure sensor. This innovation is crucial for ensuring that substrates are properly handled during the manufacturing process.
Career Highlights
Throughout his career, Yuichiro Shimose has worked with prominent companies, including Sony Corporation and Kabushiki Kaisha Shibaura Seisakusho. His experience in these organizations has contributed to his expertise in the field of sputtering technology.
Collaborations
One of his notable collaborators is Jiro Ikeda, with whom he has worked on various projects related to his patents.
Conclusion
Yuichiro Shimose's contributions to sputtering technology through his innovative patents demonstrate his commitment to advancing manufacturing processes. His work continues to influence the industry, ensuring higher efficiency and quality in thin film deposition.