Yuichiro Gotoh

Title: Yuichiro Gotoh: Innovator in Semiconductor Defect Classification

Introduction

Yuichiro Gotoh is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the classification of defects on semiconductor wafers. His innovative approach has led to advancements in the inspection processes used in semiconductor manufacturing.

Latest Patents

Yuichiro Gotoh holds a patent for a "Method and apparatus for classifying a defect on a semiconductor wafer." This patent describes a process where a surface image of a semiconductor wafer with a defect is captured as an inspection image. Simultaneously, a reference image of a defect-free wafer is stored in an image memory. By analyzing the density difference between these images, defects in both wiring and non-wiring regions can be extracted. The method utilizes luminance information from these extracted images to determine the type of defect and identify the production process where the defect occurred. He has 1 patent to his name.

Career Highlights

Throughout his career, Yuichiro Gotoh has worked with prominent companies in the semiconductor industry. He has been associated with Kabushiki Kaisha Kobe Seiko Sho and Texas Instruments Japan Limited. His work in these organizations has allowed him to develop and refine his innovative techniques in semiconductor defect classification.

Collaborations

Yuichiro Gotoh has collaborated with several professionals in his field, including Shingo Sumie and Tsutomu Morimoto. These collaborations have contributed to the advancement of technology in semiconductor inspection and defect analysis.

Conclusion

Yuichiro Gotoh's contributions to semiconductor technology, particularly in defect classification, have made a significant impact on the industry. His innovative methods continue to influence the processes used in semiconductor manufacturing today.