Company Filing History:
Years Active: 2025
Title: Yuhong Lang: Innovator in Low Pressure Furnace Technology
Introduction
Yuhong Lang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics through his innovative approaches to furnace technology. His work focuses on improving processes that enhance the efficiency and effectiveness of low pressure furnaces.
Latest Patents
Yuhong Lang holds a patent for a "Method for purge clean of low pressure furnace." This patent outlines a comprehensive process that includes several steps. First, it provides a process chamber of the low pressure furnace in a standby state, where an inner wall thin film formed by a furnace deposition process accumulates on the surface of the inner wall. Next, it involves performing temperature ramp-up or temperature ramp-down treatment on the process chamber to generate first thermal stress in the inner wall thin film, causing thin film particles with poor adhesion to peel off. The method then introduces a cleaning gas in a pulse manner to perform cycle purge clean on the process chamber, effectively removing the peeling thin film particles. Finally, it switches the state of the process chamber back to the standby state after the cycle purge clean ends. This innovative method enhances the maintenance and operational efficiency of low pressure furnaces.
Career Highlights
Yuhong Lang is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to develop and refine technologies that impact the microelectronics industry. His expertise in furnace technology has positioned him as a key player in his field.
Collaborations
Yuhong Lang collaborates with Xinxing Tu, a fellow professional in the industry. Their partnership contributes to the advancement of innovative solutions in microelectronics.
Conclusion
Yuhong Lang's contributions to low pressure furnace technology exemplify the importance of innovation in the microelectronics sector. His patented methods not only improve operational efficiency but also pave the way for future advancements in the field.