Yokohama, Japan

Yuhei Muro


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yuhei Muro in Semiconductor Technology

Introduction

Yuhei Muro is a noteworthy inventor based in Yokohama, Japan, recognized for his advancements in semiconductor technology. With a focus on laser devices, Muro's contributions have significantly impacted the field of electronics.

Latest Patents

Muro holds a patent for a semiconductor laser device featuring a double heterojunction structure. This innovative device comprises an active layer of Gallium Aluminum Arsenide (GaAlAs) where the laser is excited. The design includes an n-Ga0.45Al0.55As clad layer and a p-Ga0.45Al0.55As clad layer that sandwich the active layer, effectively confining laser light within it. In addition, he developed an n-GaAs current blocking layer situated between the active layer and the p-Ga0.45Al0.55As clad layer, which plays a crucial role in current confinement. Furthermore, a p-Ga0.63Al0.37As optical waveguide layer is placed between the active layer and the current confinement layer, possessing a refractive index greater than that of the clad layers, enhancing the optical performance of the device.

Career Highlights

Currently, Yuhei Muro is associated with Kabushiki Kaisha Toshiba, where he utilizes his expertise to further develop semiconductor technologies. His patent demonstrates his dedication to improving the efficiency and effectiveness of laser devices, showcasing his innovative spirit and technical knowledge.

Collaborations

Throughout his career, Muro has collaborated with talented colleagues, including Nawoto Motegi and Masaki Okajima. These partnerships reflect a robust environment of teamwork and shared vision, essential in driving innovations in technology.

Conclusion

Yuhei Muro's contributions to semiconductor laser technology mark him as a significant figure in the field. His innovative patent not only advances the technology but also demonstrates the importance of collaboration in achieving remarkable results. As advancements continue, Muro's work will likely inspire further innovations in semiconductor devices and beyond.

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