Company Filing History:
Years Active: 2023
Title: Yuhei Kuwana: Innovator in IGZO Sputtering Technology
Introduction
Yuhei Kuwana is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. His work focuses on improving the properties of materials used in various technological applications.
Latest Patents
Kuwana holds a patent for an IGZO sputtering target. The objective of this invention is to provide a sputtering target that enhances uniformity for properties such as the number of microcracks, the number of pores in the sintered body structure, and surface roughness. The IGZO sputtering target consists of an oxide sintered body made from indium (In), gallium (Ga), zinc (Zn), and unavoidable impurities. Notably, the lightness difference, denoted as ΔL*, on the surface of the oxide sintered body must satisfy the condition ΔL* < 3.0. This is calculated by subtracting the lightness Lc* at the central portion from the lightness Le* at a position 10 mm from the end portion towards the central portion. Additionally, the oxide sintered body must have a relative density of 97.0% or more. He has 1 patent to his name.
Career Highlights
Yuhei Kuwana is currently employed at JX Metals Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology behind sputtering targets, which are crucial for various applications in electronics and optics.
Collaborations
Kuwana has collaborated with notable colleagues such as Kozo Osada and Jun Kajiyama. Their combined expertise has contributed to the successful development of advanced materials and technologies.
Conclusion
Yuhei Kuwana is a prominent figure in the field of sputtering technology, with a focus on improving material properties through innovative solutions. His contributions continue to impact the industry positively.