Yuh-Lin Wang

Title: Innovations by Inventor Yuh-Lin Wang: Pioneering Device Fabrication Techniques

Introduction

Yuh-Lin Wang, an accomplished inventor based in North Plainfield, NJ, has made significant contributions to the field of semiconductor device fabrication. With a total of two patents to her name, Wang is recognized for her innovative approaches that enhance the performance and efficiency of integrated circuits.

Latest Patents

Wang's latest patents focus on device fabrication techniques critical for producing fine-featured integrated circuits. The first patent describes an expedient method for fabricating integrated circuits that involves aperture pattern delineation to create a masking layer atop a semiconductor body. This method allows the epitaxial growth of device-functional layered material within controlled atmosphere chambers, ensuring the critical properties of the epitaxial material by removing any contamination or crystalline damage through minimal material thinning.

The second patent outlines a series of steps designed to fabricate fine-featured devices, emphasizing the importance of selective surface irradiation, such as ion beam exposure, to facilitate the removal of masking material. This innovative process leads to the creation of structures with minimum feature sizes of one micrometer and smaller, enhancing the quality of electronic and optical functions within integrated circuits.

Career Highlights

Yuh-Lin Wang has had a distinguished career at AT&T Bell Laboratories, a renowned research institution known for advancing telecommunications and semiconductor technologies. Her work there has significantly impacted the development of high-performance electronic devices, making her a key figure in her field.

Collaborations

Throughout her career, Wang has collaborated with esteemed colleagues, including Henryk Temkin and Lloyd R. Harriott. These partnerships have fostered innovation and contributed to the successful development of advanced fabrication techniques that are now applied in modern semiconductor technologies.

Conclusion

Yuh-Lin Wang stands out as a visionary inventor in the realm of device fabrication. Her patents highlight her ability to integrate advanced techniques and innovative processes, paving the way for the next generation of integrated circuits. As the industry continues to evolve, Wang's contributions will undoubtedly serve as a foundation for future innovations in semiconductor technology.