Suzhou, China

Yuanyuan Xing


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):

Title: Innovations of Yuanyuan Xing in Magnetic Film Technology

Introduction

Yuanyuan Xing is an accomplished inventor based in Suzhou, China. He has made significant contributions to the field of magnetic film technology, particularly through his innovative patent. His work focuses on enhancing the performance of multilayer magnetic films, which have various applications in high-frequency technologies.

Latest Patents

Yuanyuan Xing holds a patent for "High frequency magnetic films, method of manufacture, and uses thereof." This patent describes a multilayer film that includes a substrate, a first magnetic layer, and a second magnetic layer. The first magnetic layer consists of FeNBM, where M can be Si, Ta, Zr, Ti, Co, or a combination thereof. The second magnetic layer is composed of FeNor FeNTa. The multilayer magnetic film demonstrates impressive properties, achieving a magnetic permeability of greater than or equal to 1800 over a frequency range of 50 MHz to 10 GHz. Additionally, it maintains a magnetic loss tangent of less than or equal to 0.3 and a cutoff frequency of greater than or equal to 1 GHz, or greater than or equal to 2 GHz.

Career Highlights

Yuanyuan Xing is currently employed at Rogers Corporation, where he continues to advance his research and development in magnetic materials. His work has positioned him as a key figure in the field, contributing to the company's reputation for innovation and excellence.

Collaborations

Yuanyuan collaborates with talented coworkers, including Yajie Chen and Xiaoyu Zhang. Their combined expertise fosters a dynamic research environment that encourages the development of cutting-edge technologies.

Conclusion

Yuanyuan Xing's contributions to magnetic film technology exemplify the impact of innovative thinking in the field of materials science. His patent and ongoing work at Rogers Corporation highlight the importance of advancements in high-frequency applications.

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