Yu-Na Kim

Title: Innovations of Yu-Na Kim

Introduction

Yu-Na Kim is a prominent inventor based in Daejeon, South Korea. She has made significant contributions to the field of photoresist compositions and patterning methods for devices. With a total of 3 patents, her work has been influential in advancing technology in this area.

Latest Patents

One of her latest patents is a negative photoresist composition and patterning method for devices. This invention relates to a photoresist composition that allows for the formation of a photoresist pattern with high sensitivity and a good reverse taper profile. This innovation not only enables effective patterning of various thin films but also facilitates the removal of the photoresist pattern after the patterning process. The composition includes an alkali-soluble binder resin, a halogen-containing first photo-acid generator, a triazine-based second photo-acid generator, a cross-linking agent with an alkoxy structure, and a solvent.

Career Highlights

Yu-Na Kim is currently employed at LG Chem, Ltd., where she continues to develop innovative solutions in her field. Her expertise and dedication have positioned her as a key player in the advancement of photoresist technology.

Collaborations

She has collaborated with notable coworkers, including Chan-Hyo Park and Kyung-Jun Kim, contributing to a dynamic and innovative work environment.

Conclusion

Yu-Na Kim's contributions to the field of photoresist compositions and patterning methods are noteworthy. Her innovative patents and collaborations reflect her commitment to advancing technology in her industry.