Company Filing History:
Years Active: 2012
Title: Innovations of Yu-Lung Jeng in Semiconductor Polishing Technology
Introduction
Yu-Lung Jeng is a notable inventor based in Tao-Yuan Hsien, Taiwan. He has made significant contributions to the field of semiconductor polishing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of polishing pads used in semiconductor manufacturing processes.
Latest Patents
Yu-Lung Jeng's latest patents include innovative designs for polishing pads and polishing devices. One of his patents describes a polishing pad that utilizes a pressure-sensitive adhesive to couple with a bottom layer. This polishing pad features a substrate with a polishing surface and a reverse surface. The unique characteristic of this invention is that the horizontal adhesion of the pressure-sensitive adhesive is higher than its vertical adhesion. This design allows for improved performance during the semiconductor polishing process.
Another patent focuses on a polishing pad that incorporates a plurality of first and second grooves on its polishing surface. The first grooves are designed to be wider and deeper than the second grooves, allowing for efficient flow of smaller scraps and polishing particles during the polishing step. This innovative design ensures that both smaller and larger particles can be effectively removed from the polishing pad, enhancing the overall polishing process.
Career Highlights
Yu-Lung Jeng is currently associated with Bestac Advanced Material Co., Ltd., where he continues to develop advanced materials for semiconductor applications. His expertise in polishing technology has positioned him as a key figure in the industry, contributing to the advancement of semiconductor manufacturing processes.
Collaborations
Throughout his career, Yu-Lung Jeng has collaborated with talented individuals such as Allen Chiu and Shao-Yu Chen. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
In summary, Yu-Lung Jeng's contributions to semiconductor polishing technology through his patents and collaborations have significantly impacted the industry. His innovative designs for polishing pads demonstrate his commitment to enhancing manufacturing processes in the semiconductor sector.