Hsinchu, Taiwan

Yu-Hsuan Chang


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021-2022

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2 patents (USPTO):Explore Patents

Title: Innovations of Yu-Hsuan Chang

Introduction

Yu-Hsuan Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in diode structures and manufacturing methods. With a total of 2 patents, his work showcases innovative approaches to enhancing electronic components.

Latest Patents

Yu-Hsuan Chang's latest patents include a diode structure and a manufacturing method thereof. This invention discloses a diode structure that comprises a semiconductor substrate, a first semiconductor layer, a second semiconductor layer, and an epitaxy layer. The semiconductor substrate features a first surface, with both semiconductor layers extending into the substrate by implanting a dopant. Notably, the types of the first and second semiconductor layers are opposite to that of the substrate. The epitaxy layer connects with both semiconductor layers and extends outwardly from the first surface, ensuring a continuous connection. The concentration distribution of the dopant within these layers follows a discontinuous curve.

Another significant patent is the transient-voltage-suppression diode structure and its manufacturing method. This structure includes a substrate, an N− type epitaxial layer, a first metal layer, a first N+ type implant layer, a deep N+ type implant layer, and multiple polycrystalline plugs. The N− type epitaxial layer is positioned on the substrate, while the first metal layer forms a working-voltage terminal. The first N+ type implant layer is embedded in the N− type epitaxial layer and corresponds spatially to the working-voltage terminal. The deep N+ type implant layer is also embedded in the N− type epitaxial layer but is spaced apart from the first N+ type implant layer. The polycrystalline plugs connect the working-voltage terminal to the deep N+ type implant layer.

Career Highlights

Yu-Hsuan Chang is currently associated with Mosel Vitelic Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in advancing diode technology, which is crucial for various electronic applications.

Collaborations

Yu-Hsuan Chang collaborates with Hsiu-Fang Lo, a talented woman in the field, contributing to the development of cutting-edge technologies.

Conclusion

Yu-Hsuan Chang's contributions to semiconductor technology through his innovative patents highlight his expertise and commitment

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