Young-Hwa No

Title: Young-Hwa No: Innovator in Plasma Etching Technology

Introduction

Young-Hwa No is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma etching technology, particularly in the manufacturing of photomasks. His innovative approach has led to the development of a unique plasma etching chamber that enhances the efficiency and precision of photomask production.

Latest Patents

Young-Hwa No holds a patent for a "Plasma etching chamber and method for manufacturing photomask using the same." This invention involves a plasma etching chamber designed for an etching process used in photomask manufacturing. The chamber features an electrode with a supporting surface for a photomask substrate, a heat transfer element along the peripheral edge, and a heater to supply heat to the element. The method includes forming a shading layer on a transparent substrate and etching it using plasma, ensuring that the temperature at the peripheral edge is maintained higher than at the center of the substrate.

Career Highlights

Young-Hwa No is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing the technology used in photomask production, which is critical for the semiconductor industry.

Collaborations

Young-Hwa No has collaborated with several talented individuals, including Jeong-Yun Lee and Jin-Min Kim. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in their field.

Conclusion

Young-Hwa No's contributions to plasma etching technology exemplify the importance of innovation in the semiconductor industry. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight his role as a key player in advancing manufacturing processes.