Location History:
- Hyogo, JP (1992 - 1993)
- Amagasaki, JP (1999)
Company Filing History:
Years Active: 1992-1999
Title: Youko Tanaka: Innovator in Semiconductor Technology
Introduction
Youko Tanaka is a prominent inventor based in Hyogo, Japan. She has made significant contributions to the field of semiconductor technology, particularly in the development of resist coating films and photosensitive resin compositions. With a total of 3 patents to her name, Tanaka's work has had a substantial impact on the industry.
Latest Patents
One of her latest patents involves a resist coating film that enhances the formation of fine patterns using a chemical-amplification-type resist film. This innovation helps inhibit the fall of acid on the surface of the resist, resulting in fine patterns that exhibit excellent shape. Additionally, she has developed a photosensitive resin composition that further advances the capabilities of semiconductor manufacturing.
Career Highlights
Tanaka is currently employed at Mitsubishi Electric Corporation, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in improving the efficiency and effectiveness of resist films used in various applications.
Collaborations
Throughout her career, Tanaka has collaborated with notable colleagues, including Shigeru Kubota and Hideo Horibe. These partnerships have fostered innovation and have contributed to the success of her projects.
Conclusion
Youko Tanaka's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in her field. Her work continues to influence advancements in the industry, showcasing the importance of innovation in technology.