Company Filing History:
Years Active: 1999-2001
Title: Innovations of Yoshitsugu Abe
Introduction
Yoshitsugu Abe is a notable inventor based in Anjo, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of 5 patents. His work focuses on methods that enhance the etching processes of silicon wafers, which are crucial in semiconductor manufacturing.
Latest Patents
One of his latest patents is a method of etching silicon wafers. This innovative technique involves anisotropic etching through an etching mask, followed by anodic oxidation. The process allows for the rounding of sharp corners formed during etching, improving the control and accuracy of the etching process. Another significant patent is an electrochemical etching method for silicon substrates with PN junctions. This method utilizes a KOH solution and a platinum electrode to smooth the etching surface of (110)-oriented silicon, ensuring a high-quality finish.
Career Highlights
Yoshitsugu Abe has worked with prominent companies such as Denso Corporation and Nippondenso Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.
Collaborations
He has collaborated with notable coworkers, including Hiroshi Tanaka and Tsuyoshi Fukada. Their joint efforts have further advanced the field of silicon wafer technology.
Conclusion
Yoshitsugu Abe's contributions to silicon wafer technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing.