Company Filing History:
Years Active: 2025
Title: Innovations by Yoshitake Nakajima in Plasma Processing Technology
Introduction
Yoshitake Nakajima is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma processing technology, particularly in the area of substrate support systems. His innovative work has led to advancements that enhance the efficiency and effectiveness of plasma deposition processes.
Latest Patents
Yoshitake Nakajima holds a patent for "Impedance control of local areas of a substrate during plasma deposition thereon in a large PECVD chamber." This patent describes methods and apparatus for measuring and controlling local impedances at a substrate support in a plasma processing chamber during substrate processing. The substrate support includes multiple support pins, each of which can have its radio frequency voltage, current, and phase measured. The impedances of these support pins can be adjusted in real time, allowing for improved control during the plasma deposition process. This innovation is crucial for optimizing the performance of plasma processing chambers.
Career Highlights
Yoshitake Nakajima is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has positioned him as a key player in the development of advanced technologies that drive the industry forward. His expertise in plasma processing has been instrumental in the company's success.
Collaborations
Yoshitake has collaborated with several talented individuals in his field, including Zheng John Ye and Andrew C Lam. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in plasma processing.
Conclusion
Yoshitake Nakajima's contributions to plasma processing technology through his innovative patent and work at Applied Materials, Inc. highlight his importance as an inventor in the field. His advancements in impedance control during plasma deposition processes are paving the way for more efficient manufacturing techniques in the semiconductor industry.