Location History:
- Chiba, JP (2013)
- Ichihara, JP (2016)
Company Filing History:
Years Active: 2013-2016
Title: Yoshitaka Uenoyama: Innovator in Photosensitive Materials
Introduction
Yoshitaka Uenoyama is an inventor based in Ichihara-shi, Japan. He is known for his work in the field of photosensitive materials, particularly in the development of innovative compounds and methods for producing them. Although he currently holds no granted patents, his contributions to the field are noteworthy.
Latest Patent Applications
Uenoyama's latest patent applications include a homoadamantane derivative and a method for producing the same, along with photosensitive materials for photoresist. The first application describes a (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester, where R and R' can be a hydrogen atom or a hydrocarbon group with 1 to 6 carbon atoms. The application also details a positive photoresist composition that includes this polymer and outlines a method for forming a photoresist pattern using the composition. The second application focuses on a homoadamantane derivative represented by a specific formula, where R and R' are similar to the previous application, and x can be a hydroxyl group or a halogen atom.
Conclusion
Yoshitaka Uenoyama's innovative work in photosensitive materials showcases his potential impact on the field, despite not having any granted patents at this time. His latest patent applications reflect a commitment to advancing technology in this area.