Yoshiro Kusumoto

Title: Yoshiro Kusumoto: Innovator in Chemical Vapor Deposition

Introduction

Yoshiro Kusumoto is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 6 patents to his name, Kusumoto's work has advanced the methods and apparatus used in this critical area of materials science.

Latest Patents

Kusumoto's latest patents include a "Method for Thermal Chemical Vapor Deposition." This innovative method involves feeding a first gas flow, which includes a reactive gas, in a laminar flowing state parallel to the substrate surface. Additionally, a second gas flow, containing a non-reactive gas, is introduced perpendicularly to the first gas flow. This design allows for external control of the flow rates, ensuring the laminar state of the first gas and concentrating it near the substrate. This method enhances the uniformity and thickness of the layers formed.

Another notable patent is the "Apparatus for Chemical Vapor Deposition." This apparatus features a substrate with a partially insulating film placed in a pressure-reduced reaction chamber. A nozzle feeds a reactive gas into the chamber, while a light source emits a beam to heat the substrate. The combination of infrared heating and a laminarized jet of reactive gas improves selectivity and facilitates the thin film forming reaction, enhancing reproducibility and controllability.

Career Highlights

Throughout his career, Yoshiro Kusumoto has worked with notable companies, including Nihon Shinku Gijutsu Kabushiki Kaisha. His expertise in chemical vapor deposition has positioned him as a key figure in the development of advanced materials and technologies.

Collaborations

Kusumoto has collaborated with esteemed colleagues such as Izumi Nakayama and Akitoshi Suzuki. Their joint efforts have contributed to the advancement of CVD technologies and have fostered innovation in the field.

Conclusion

Yoshiro Kusumoto's contributions to chemical vapor deposition technology have been significant and impactful. His innovative methods and apparatus continue to influence the industry, showcasing his dedication to advancing materials science.