Company Filing History:
Years Active: 2002
Title: Innovations of Yoshinori Tagashira
Introduction
Yoshinori Tagashira is a notable inventor based in Shinnanyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced silica dispersions. His work has implications for various industrial applications, showcasing the importance of innovation in enhancing material properties.
Latest Patents
Yoshinori Tagashira holds a patent for a "Cationic polymer-modified silica dispersion and production process for the same." This invention involves a cationic polymer-modified silica dispersion that comprises silica fine particles with an average particle diameter of less than 200 nm. The dispersion is characterized by its ability to prevent coagulation of the silica particles, which is crucial for maintaining stability in various applications. The dispersion, when diluted to a solid concentration of 1.5% by weight, exhibits a light scattering index (n value) of 2.0 or more. The production process involves oppositely-colliding a mixed solution of silica and cationic polymer in a polar solvent at a treating pressure of 300 kgf/cm or more.
Career Highlights
Yoshinori Tagashira is currently associated with Tokuyama Corporation, where he continues to innovate and develop new materials. His expertise in polymer chemistry and material science has positioned him as a key figure in his field. His contributions have not only advanced the understanding of silica dispersions but have also paved the way for new applications in various industries.
Collaborations
Throughout his career, Yoshinori has collaborated with esteemed colleagues such as Hiroyuki Kono and Kenji Fukunaga. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Yoshinori Tagashira's work exemplifies the spirit of innovation in material science. His patented technology for cationic polymer-modified silica dispersions highlights the potential for advancements in industrial applications. His contributions continue to inspire future innovations in the field.