Yoshinori Hoshina

Title: Innovations of Yoshinori Hoshina

Introduction

Yoshinori Hoshina is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of lithography through his innovative patent. His work primarily focuses on enhancing the manufacturing processes of solid-state devices.

Latest Patents

Hoshina holds a patent for a mask structure having a phase-shifting pattern suitable for forming fine features. This mask structure includes two or more groups of device patterns formed on a single transparent support plate. Each device pattern features a transparent partial pattern, and one or both groups are equipped with phase-shifting patterns to improve resolution in lithography. The design allows for the combination of transparent partial patterns through multiple transmissions of an exposure beam, facilitating the manufacturing of solid-state devices.

Career Highlights

Yoshinori Hoshina is associated with Hitachi, Ltd., where he has been able to apply his innovative ideas in a practical setting. His work has contributed to advancements in the technology used for producing high-resolution devices.

Collaborations

Hoshina has collaborated with notable coworkers, including Ryo Imura and Kengo Asai. Their combined efforts have furthered the development of technologies in their field.

Conclusion

Yoshinori Hoshina's contributions to the field of lithography and solid-state device manufacturing highlight his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the precision of device fabrication.