Company Filing History:
Years Active: 2007
Title: The Innovative Contributions of Yoshimitsu Ishikawa
Introduction
Yoshimitsu Ishikawa is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of thin film transistors, showcasing his expertise through innovative patent work. His dedication to advancing technology is evident in his unique approach to patterning methods.
Latest Patents
Ishikawa holds a patent for a method of patterning a thin film transistor that includes simultaneously forming a gate electrode and a pixel electrode. This innovative technique allows for high-precision patterning while preventing variations in half-tone resist thickness due to the presence or absence of a base film. The patent describes a photomask that incorporates a transmitting portion and two types of semi-transmitting portions, which provide different quantities of transmitted light. This method regulates luminous exposure effectively, resulting in a half-tone resist with uniform thickness.
Career Highlights
Ishikawa is currently employed at Advanced Display, Inc., where he continues to push the boundaries of display technology. His work has been instrumental in enhancing the performance and efficiency of thin film transistors, making a lasting impact on the industry.
Collaborations
Ishikawa has collaborated with talented individuals such as Takehisa Yamaguchi and Ken Nakashima. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Yoshimitsu Ishikawa's contributions to the field of thin film transistors exemplify his commitment to innovation. His patent work and collaborations highlight the importance of teamwork in advancing technology. His achievements continue to inspire future inventors and researchers in the industry.