Yoshimasa Sugimoto

Title: Yoshimasa Sugimoto: Innovator in Semiconductor Processing

Introduction

Yoshimasa Sugimoto is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative methods that enhance the quality of fine patterns on semiconductor wafers. His work has implications for various applications in electronics and materials science.

Latest Patents

Yoshimasa Sugimoto holds a patent for a method capable of forming a fine pattern without crystal defects. This method involves processing a compound semiconductor wafer to deposit or form a specific layer on its surface. The process includes partially removing this layer to expose the wafer surface and etching the exposed area using an electron beam and specific gases, such as chlorine or bromine. The specific layer can be an oxide, sulphide, or nitride layer, and the etching process can be conducted in an airtight environment to prevent exposure to air.

Career Highlights

Throughout his career, Sugimoto has worked with prominent organizations, including the Optoelectronics Technology Research Corporation and the National Institute for Materials Science. His experience in these institutions has allowed him to refine his techniques and contribute to advancements in semiconductor technology.

Collaborations

Yoshimasa Sugimoto has collaborated with notable colleagues, including Akita Kenzo and Mototaka Taneya. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.

Conclusion

Yoshimasa Sugimoto's contributions to semiconductor processing through his patented methods demonstrate his expertise and commitment to innovation. His work continues to influence the development of advanced materials and technologies in the electronics industry.