Kawasaki, Japan

Yoshimasa Ilduka


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshimasa Ilduka

Introduction

Yoshimasa Ilduka is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of data processing, particularly in the development of methods and apparatuses that enhance the efficiency of circuit pattern processing.

Latest Patents

Ilduka holds a patent for a data processing method and apparatus, which includes a reticle mask, exposing method and apparatus, and recording medium. This innovative data processing apparatus features a grid pattern area calculation section that calculates the minimum grid and the present area of a circuit element for each layer of circuit patterns provided by CAD data. Additionally, it includes an overlap area calculation section for determining the overlap area of present areas, and a composition/division optimization judgment section that assesses whether the layers with the overlap area should be processed using a single common grid or different grids. This approach allows each layer to be assigned the grid with the minimum accuracy required, thereby relieving the operational load in creating reticle mask data and processing load during exposure.

Career Highlights

Yoshimasa Ilduka is currently employed at Fujitsu Corporation, where he continues to innovate and contribute to advancements in data processing technologies. His work has been instrumental in improving the efficiency of circuit design and manufacturing processes.

Collaborations

Ilduka has collaborated with notable colleagues such as Kenji Kikuchi and Tomoyuki Okada, further enhancing the innovative capabilities within his team.

Conclusion

Yoshimasa Ilduka's contributions to data processing technology exemplify the impact of innovative thinking in the field. His patent reflects a significant advancement that addresses operational challenges in circuit pattern processing.

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