Nagoya, Japan

Yoshikazu Kagata


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yoshikazu Kagata in Vapor-Phase Epitaxy

Introduction

Yoshikazu Kagata, an esteemed inventor based in Nagoya, Japan, has made significant strides in the field of semiconductor manufacturing. His innovative approach to vapor-phase epitaxy has the potential to enhance the quality and efficiency of silicon crystal film production, marking him as a prominent figure among contemporary inventors.

Latest Patents

Kagata holds a patent for a novel process entitled "Vapor-phase epitaxial growth process by a hydrogen pretreatment step." This invention focuses on the vapor-phase growth of silicon single crystal films on silicon substrates by employing a diluted disilane method. The process operates at a linear speed ranging from 5 to 100 cm/min, and it incorporates a crucial pretreatment step involving heating the substrate in a hydrogen stream at temperatures of 1,000°C or higher for at least 30 minutes prior to the growth process. This advancement not only streamlines the production method but also enhances the quality of the resulting silicon films.

Career Highlights

Kagata's career is marked by his collaboration with Toagosei Chemical Industry Co., Ltd., where he has been able to apply his innovative ideas in a real-world industrial context. His commitment to advancing semiconductor technologies has solidified his reputation in the field, contributing greatly to the ongoing research and development initiatives at his company.

Collaborations

One notable collaboration in Kagata's career is with his coworker Katsuyoshi Harada. Together, they have combined their expertise to push the boundaries of vapor-phase epitaxy processes, aiming to create more efficient and effective methods for producing high-quality silicon crystals.

Conclusion

In conclusion, Yoshikazu Kagata's contributions to the field of vapor-phase epitaxy signify an important advancement in semiconductor manufacturing. His innovative patent, along with fruitful collaborations, showcases the vital role inventors play in driving technological progress. Kagata's work at Toagosei Chemical Industry Co., Ltd. exemplifies the impactful intersection of research and industry, paving the way for future innovations in the field.

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