Tokyo, Japan

Yoshikatu Sawada


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: **Innovator Yoshikatu Sawada: Pioneering Water-Based Photosensitive Compositions**

Introduction

Yoshikatu Sawada, based in Tokyo, Japan, is an inventive mind known for his significant contribution to the field of materials science. His groundbreaking research revolves around a water-based photosensitive composition that utilizes a hydrolyzate of mammal collagen, which provides unique properties beneficial to various applications, particularly in photoresist technology.

Latest Patents

Sawada holds a patent for a water-based photosensitive composition that includes a hydrolyzate of mammal collagen combined with a photosensitizer. This innovative composition is designed to cross-link the hydrolyzate when exposed to active light. The hydrolyzate exhibits a number-average molecular weight, Mn, ranging from 2,000 to 30,000 and an intrinsic viscosity of 0.060 to 0.155 dl/g when analyzed in a 0.15 mole citric acid buffer solution at 40 degrees Celsius. The formulation maintains the formability of the collagen fold and results in a photoresist pattern characterized by high resolution, excellent dyeing properties, and strong corrosion resistance.

Career Highlights

Throughout his career, Yoshikatu Sawada has made remarkable strides in the industry while being associated with reputed companies. He has worked at Toppan Printing Co., Ltd. and Nippi Corporation, where he has applied his innovative research to real-world applications, contributing to advancements in photoresist materials.

Collaborations

Sawada's journey in innovation has seen him working alongside esteemed colleagues such as Kazuo Shirakawa and Takeo Sugiura. Their collective expertise and collaboration have fostered an environment of creative problem-solving, leading to significant advancements in their respective fields.

Conclusion

Yoshikatu Sawada's work serves as a testament to the intersection of innovation and practical application within materials science. His patented water-based photosensitive composition not only enhances the capabilities of photoresist technology but also reflects his dedication to advancing the industry through collaborative efforts. As innovations continue to evolve, the contributions of inventors like Sawada will undoubtedly influence the future landscape of materials and their applications.

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