Kudamatsu, Japan

Yoshie Tanaka


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 69(Granted Patents)


Company Filing History:


Years Active: 1986-1991

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Yoshie Tanaka

Introduction

Yoshie Tanaka, an accomplished inventor based in Kudamatsu, Japan, has significantly contributed to the field of semiconductor technology. With a total of two registered patents, her innovative solutions have enhanced processes in sample treatment and etching monitoring.

Latest Patents

Tanaka's latest inventions include a "Sample Treating Method and Apparatus" and a "Method and Apparatus for Monitoring Etching." The first patent introduces a method adapted for treating semiconductor substrates that require both etching and anticorrosion treatments. This advanced technology utilizes plasma from an anticorrosion gas to remove adhered materials effortlessly, improving the throughput of treated samples without necessitating a wet-type anticorrosion treatment.

Her second patent focuses on monitoring the etching process. It details a method that regulates the gas pressure inside a treating chamber during a dry etching process, allowing for precise observation of the etching state through the analysis of the emission line spectrum over time. This innovative apparatus effectively combines exhaust means, plasma generation, and spectrum detection to ensure optimal control during fabrication.

Career Highlights

Yoshie Tanaka is affiliated with Hitachi, Ltd., where she continues to push the boundaries of technology through her inventive spirit. Her profound understanding of semiconductor processing techniques has established her as a key player in her field.

Collaborations

Throughout her career, Tanaka has collaborated with talented professionals, including Kotaro Fujimoto and Hironobu Kawahara. Their joint efforts contribute to advancing semiconductor technology and improving industry standards.

Conclusion

Yoshie Tanaka’s contributions through her patents reflect her dedication to innovation in semiconductor technology. Her work exemplifies how targeted inventions can pave the way for advancements in manufacturing and processing techniques, showcasing the impact that a single inventor can have on the industry.

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