Company Filing History:
Years Active: 1992
Title: Yoshiaki Okajima: Innovator in Thin Film Semiconductor Technology
Introduction
Yoshiaki Okajima is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of thin film semiconductor devices. His work has implications for display devices in active matrix systems, showcasing his innovative approach to enhancing device performance.
Latest Patents
Yoshiaki Okajima holds a patent for a "Thin film semiconductor device and method for fabricating the same." This invention focuses on improving the characteristics of thin film semiconductor devices, specifically targeting the structure related to the dominant orientation of a poly-Si film used as an active layer in thin film transistors (TFTs). The patent outlines a method for fabricating these devices at relatively low process temperatures, which is crucial for maintaining the integrity of the semiconductor substrate. The resulting poly-Si film exhibits a dominant orientation of (111), formed through a controlled process involving temperatures up to 570°C and subsequent annealing at temperatures up to 640°C.
Career Highlights
Yoshiaki Okajima is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced semiconductor technologies that contribute to the company's reputation for excellence in the electronics industry.
Collaborations
Throughout his career, Yoshiaki has collaborated with esteemed colleagues such as Takashi Aoyama and Nobutake Konishi. These collaborations have fostered a productive environment for innovation and have led to advancements in semiconductor technology.
Conclusion
Yoshiaki Okajima's contributions to thin film semiconductor technology highlight his role as an innovator in the field. His patent and work at Hitachi, Ltd. demonstrate his commitment to advancing technology for high-performance display devices.