Company Filing History:
Years Active: 1990
Title: Yoon G Kim: Innovator in Boron-Containing Films
Introduction
Yoon G Kim is a prominent inventor based in Syracuse, NY (US). She has made significant contributions to the field of materials science, particularly in the deposition of boron-containing films. Her innovative work has led to the development of a unique patent that enhances the production of boron nitride films.
Latest Patents
Yoon G Kim holds a patent titled "Deposition of boron-containing films from decaborane." This patent describes a method for depositing a boron nitride film by introducing decaborane and dry nitrogen or ammonia into a plasma-assisted chemical vapor deposition chamber. The process requires maintaining a nitrogen or ammonia partial pressure that exceeds the decaborane pressures, specifically 200 milliTorr of N₂ or NH₃ and 50 milliTorr of B₁₀H₁₄. This innovative approach allows for the production of various film layers starting from decaborane. She has 1 patent to her name.
Career Highlights
Yoon G Kim is affiliated with Syracuse University, where she continues her research and development in advanced materials. Her work has garnered attention for its potential applications in various industries, including electronics and nanotechnology.
Collaborations
Yoon has collaborated with notable colleagues such as James T Spencer and Peter A Dowben, contributing to a dynamic research environment that fosters innovation and discovery.
Conclusion
Yoon G Kim's contributions to the field of materials science, particularly through her patent on boron-containing films, highlight her role as a leading inventor. Her work at Syracuse University and collaborations with esteemed colleagues further emphasize her impact on the industry.