Yonglin Wang

Title: Yonglin Wang: Innovator in Photocurable Compositions

Introduction

Yonglin Wang is a notable inventor based in Beijing, China. He has made significant contributions to the field of photocurable compositions, particularly through his innovative use of mercapto benzophenone compounds. With a total of 2 patents, his work addresses critical challenges in photo-curing technology.

Latest Patents

Wang's latest patent focuses on "Mercapto benzophenone compounds, compositions and preparation method thereof." This invention provides a photocurable composition that utilizes mercapto benzophenone compounds as key raw materials. The aim is to resolve issues found in prior photo-curing technologies, such as the tendency of low-molecular photoinitiators to remain and migrate. Additionally, it addresses the low initiation efficiency of macromolecular photoinitiators due to a low content of effective components. The photocurable composition developed by Wang can be easily prepared and demonstrates high addition efficiency with ethylenically unsaturated compounds. Importantly, the resulting composition has no residual mercapto and features high initiation activity with zero migration rates when used in photocurable coatings, binders, and ink formulas.

Career Highlights

Wang has worked with Insight High Technology (Beijing) Co. Ltd. and Insight High Technology Co., Ltd. His experience in these companies has contributed to his expertise in the field of photocurable compositions.

Collaborations

Some of his notable coworkers include Wenchao Zhao and Zhongli Ma. Their collaboration has likely played a role in advancing their shared goals in innovation.

Conclusion

Yonglin Wang's contributions to photocurable compositions highlight his innovative spirit and dedication to solving complex problems in technology. His work continues to influence the field and pave the way for future advancements.