Yong-Pil Han

Title: Innovations by Yong-Pil Han in Semiconductor Technology

Introduction

Yong-Pil Han is a notable inventor based in Ann Arbor, MI, who has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, his work focuses on improving the efficiency and effectiveness of semiconductor devices.

Latest Patents

Yong-Pil Han's latest patents include a semiconductor device featuring a planarized surface and a method thereof. This invention addresses the dishing phenomenon that can occur during the manufacturing process of semiconductor substrates. The method involves forming a patterned etch stop layer on a substrate, followed by etching to create a trench region. A medium material layer and an oxide layer are then deposited, and chemical mechanical polishing (CMP) is performed to achieve a planarized oxide layer. The use of a slurry containing an anionic surfactant enhances the CMP removal ratio, thereby reducing dishing occurrences. His second patent involves chemical mechanical polishing slurries that provide high planarity and selectivity ratios, which are essential for effective semiconductor processing.

Career Highlights

Yong-Pil Han is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the methods used in the semiconductor manufacturing process.

Collaborations

Throughout his career, Yong-Pil Han has collaborated with notable colleagues, including Jae-Dong Lee and Bo-un Yoon. These collaborations have contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Yong-Pil Han's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work not only addresses current challenges but also paves the way for future developments in semiconductor manufacturing.