Potsdam, NY, United States of America

Yong Lin


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: **Yong Lin: Innovator in Chemical Mechanical Planarization**

Introduction

Yong Lin, an inventive mind based in Potsdam, NY, has made significant contributions to the field of semiconductor processing through his innovative work in abrasive compositions. With a keen understanding of material science, Lin's patent addresses critical challenges in chemical mechanical planarization (CMP), an essential process in the manufacturing of semiconductor devices.

Latest Patents

Yong Lin holds a patent for an "Abrasive composition containing organic particles for chemical mechanical planarization." This inventive composition consists of abrasive particles made from organic resin, specifically designed to enhance CMP processes in the semiconductor industry. The patent details a unique aqueous slurry that maintains a pH ranging from 2 to 12, enabling selective removal of various materials from surfaces. The performance attributes of this composition include efficient polishing rates and superior surface quality, making it a valuable addition to CMP applications.

Career Highlights

Lin is currently affiliated with Dynea Canada Ltd., a company known for its innovative chemical solutions. His role in product development and research contributes significantly to advancements in semiconductor technology. The impact of his work is reflected in the ever-evolving landscape of semiconductor manufacturing, where efficient processing is key to functionality and performance.

Collaborations

Yong Lin collaborates with esteemed colleagues Yuzhuo Li and Guomin Bian, who contribute to the development and refinement of abrasive compositions. Their teamwork exemplifies the importance of collaboration in the research and innovation process, allowing for diverse perspectives and expertise to enhance project outcomes.

Conclusion

Yong Lin's contributions to the field of chemical mechanical planarization underscore the critical role of innovation in semiconductor manufacturing. As technology continues to evolve, the applications and effectiveness of his patented abrasive composition are likely to play a pivotal role in the industry. His work will undoubtedly inspire further advancements in chemical solutions for semiconductor processes.

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