Yoichiro Numazawa

Title: Yoichiro Numazawa: Innovator in Plasma Processing Technology

Introduction

Yoichiro Numazawa is a notable inventor based in Machida, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique plasma processing system that enhances substrate processing capabilities.

Latest Patents

Numazawa holds 1 patent for his invention titled "Plasma processing system." This system features a vacuum chamber designed to accommodate a substrate and generate plasma. The system includes an antenna and a high-frequency power source that supplies power to the antenna. The antenna emits high-frequency power, generating plasma within the vacuum chamber, which processes the substrate's surface. The design of the antenna includes a disk-shaped conductor plate and a coaxial waveguide with a folded portion, which prevents standing waves and allows for the generation of high-density plasma. This innovation enables the processing of large area substrates effectively.

Career Highlights

Throughout his career, Numazawa has demonstrated a commitment to advancing plasma processing technologies. His work has been instrumental in improving the efficiency and effectiveness of substrate processing in various applications.

Collaborations

Numazawa has collaborated with notable colleagues, including Noriyoshi Sato and Satoru Iizuka. Their combined expertise has contributed to the success of their projects and innovations in the field.

Conclusion

Yoichiro Numazawa's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patent for the plasma processing system showcases his ability to solve complex challenges in substrate processing. His work continues to influence advancements in this critical area of technology.