Shunan, Japan

Yohei Chikashige


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017-2024

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovations of Yohei Chikashige

Introduction

Yohei Chikashige is a notable inventor based in Shunan, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced silsesquioxane particles. With a total of 2 patents to his name, Chikashige continues to push the boundaries of innovation.

Latest Patents

Chikashige's latest patents include the creation of spherical polymethylsilsesquioxane particles. This novel particle boasts an unprecedentedly large specific surface area ratio. The particle consists of a network structure formed by silicon and oxygen atoms, along with methyl and alkoxyl groups. The specific surface area is measured using a nitrogen adsorption BET one-point method, ensuring high performance in various applications. Another significant patent involves hydrophobized spherical polyalkylsilsesquioxane fine particles, which are utilized as external additives for toner and dry toners in electrophotography. These fine particles are produced through a meticulous process that includes mixing raw materials and hydrophobizing agents.

Career Highlights

Chikashige is currently employed at Tokuyama Corporation, where he continues to innovate and develop new materials. His work has garnered attention in the industry, showcasing his expertise in the field of silsesquioxane technology.

Collaborations

Chikashige has collaborated with notable coworkers such as Tadaharu Komatsubara and Kenichi Ishizu. Their combined efforts have contributed to the advancement of materials science and the development of innovative products.

Conclusion

Yohei Chikashige's contributions to the field of materials science through his patents and work at Tokuyama Corporation highlight his role as a leading inventor. His innovative approaches to silsesquioxane particles are paving the way for future advancements in technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…